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cs.LG2026
Pushing the Limits of Inverse Lithography with Generative Reinforcement Learning
Haoyu Yang, Haoxing Ren
Inverse lithography (ILT) is critical for modern semiconductor manufacturing but suffers from highly non-convex objectives that often trap optimization in poor local minima. Genera…
cs.LG2024
ILILT: Implicit Learning of Inverse Lithography Technologies
Haoyu Yang, Haoxing Ren
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography syst…
cs.LG2024
Optimizing Predictive AI in Physical Design Flows with Mini Pixel Batch Gradient Descent
Haoyu Yang, Anthony Agnesina, Haoxing Ren
Exploding predictive AI has enabled fast yet effective evaluation and decision-making in modern chip physical design flows. State-of-the-art frameworks typically include the object…