108 citations · 626 across the 22 of their papers we have counts for
22 papers
Hybrid approach to reconstruct nanoscale grating dimensions using scattering and fluorescence with soft X-rays
Leonhard M. Lohr, Richard Ciesielski, Vinh-Binh Truong +1
Scatterometry is a tested method for measuring periodic semiconductor structures. Since the sizes of modern semiconductor structures have reached the nanoscale regime, the challeng…
Polygon-based unified Fourier-modal approach for diffractive optics simulations
K. V. Nikolaev, V. Soltwisch, M. A. Botchev +4
In this article, we derive a theoretical formalism that unifies the rigorous coupled wave analysis and the dynamical diffraction theory. Based on this formalism, we design a comput…
Grazing incidence X-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction
Anna Andrle, Philipp Hönicke, Philipp Schneider +6
For the reliable fabrication of the current and next generation of nanostructures it is essential to be able to determine their material composition and dimensional parameters. Usi…
Time-frequency analysis assisted reconstruction of ruthenium optical constants in the sub-EUV spectral range 8nm-23.75nm
Qais Saadeh, Philipp Naujok, Vicky Philipsen +9
The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film…
On uncertainties in the reconstruction of nanostructures in EUV scatterometry and grazing incidence small-angle X-ray scattering
Analía Fernández Herrero, Victor Soltwisch, Mika Pflüger +2
Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive m…
Shape- and element-sensitive reconstruction of periodic nanostructures with grazing incidence X-ray fluorescence analysis and machine learning
Anna Andrle, Philipp Hönicke, Grzegorz Gwalt +4
The characterization of nanostructured surfaces with sensitivity in the sub-nm range is of high importance for the development of current and next generation integrated electronic…