20 citations · 38 across the 7 of their papers we have counts for
4 papers · 1 filter
The refined EUV mask model
I. A. Makhotkin, M. Wu, V. Soltwisch +2
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facili…
Extracting Dimensional Parameters of Gratings Produced with Self-Aligned Multiple Patterning Using GISAXS
Mika Pflüger, R. Joseph Kline, Analía Fernández Herrero +3
Background: To ensure consistent and high-quality semiconductor production at future logic nodes, additional metrology tools are needed. For this purpose, grazing-incidence small-a…
Applicability of the Debye-Waller damping factor for the determination of the line-edge roughness of lamellar gratings
Analía Fernández Herrero, Mika Pflüger, Jürgen Probst +2
Periodic nanostructures are fundamental elements in optical instrumentation as well as basis structures in integrated electronic circuits. Decreasing sizes and increasing complexit…
Distortion analysis of crystalline and locally quasicrystalline 2D photonic structures with GISAXS
Mika Pflüger, Victor Soltwisch, Jolly Xavier +4
In this study, grazing incidence small-angle X-ray scattering (GISAXS) is used to collect statistical information on dimensional parameters in an area of 20 mm x 15 mm on photonic…