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20182021
most citedGrazing incidence-X-ray fluorescence for a dimensional and elemental characterization of well-ordered nanostructures

20 citations · 35 across the 5 of their papers we have counts for

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physics.app-ph2021

Grazing incidence X-ray fluorescence based characterization of nanostructures for element sensitive profile reconstruction

Anna Andrle, Philipp Hönicke, Philipp Schneider +6

For the reliable fabrication of the current and next generation of nanostructures it is essential to be able to determine their material composition and dimensional parameters. Usi…

physics.app-ph2021

On uncertainties in the reconstruction of nanostructures in EUV scatterometry and grazing incidence small-angle X-ray scattering

Analía Fernández Herrero, Victor Soltwisch, Mika Pflüger +2

Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive m…

physics.app-ph2021

Shape- and element-sensitive reconstruction of periodic nanostructures with grazing incidence X-ray fluorescence analysis and machine learning

Anna Andrle, Philipp Hönicke, Grzegorz Gwalt +4

The characterization of nanostructured surfaces with sensitivity in the sub-nm range is of high importance for the development of current and next generation integrated electronic…

physics.app-ph202020 cited

Grazing incidence-X-ray fluorescence for a dimensional and elemental characterization of well-ordered nanostructures

Philipp Hönicke, Anna Andrle, Yves Kayser +6

The increasing importance of well-controlled ordered nanostructures on surfaces represents a challenge for existing metrology techniques. To develop such nanostructures and monitor…

physics.app-ph2019

The refined EUV mask model

I. A. Makhotkin, M. Wu, V. Soltwisch +2

A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facili…

physics.app-ph201912 cited

Extracting Dimensional Parameters of Gratings Produced with Self-Aligned Multiple Patterning Using GISAXS

Mika Pflüger, R. Joseph Kline, Analía Fernández Herrero +3

Background: To ensure consistent and high-quality semiconductor production at future logic nodes, additional metrology tools are needed. For this purpose, grazing-incidence small-a…