Post-growth annealing of GaMnAs under As capping - an alternative way to increase Tc
arXiv:cond-mat/0406584 · doi:10.1063/1.1875746
Abstract
We demonstrate that in situ post-growth annealing of GaMnAs layers under As capping is adequate for achieving high Curie temperatures (Tc) in a similar way as ex situ annealing in air or in N2 atmosphere practiced earlier.
13 pages, 4 figures
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Cited by in corpus (7)
- Cubic anisotropy in high homogeneity thin (Ga,Mn)As layers
- Influence of annealing parameters on the ferromagnetic properties of optimally passivated (Ga,Mn)As epilayers
- Hydrostatic pressure study of paramagnetic-ferromagnetic phase transition in (Ga,Mn)As
- Effect of low-temperature annealing on the electronic- and band-structure of (Ga,Mn)As epitaxial layers
- Structural and optical properties of self-catalytic GaAs:Mn nanowires grown by molecular beam epitaxy on silicon substrates
- Annealing-induced changes of the magnetic anisotropy of (Ga,Mn)As epilayers
- Formation of Epitaxial MnBi Layers on (Ga,Mn)As