High-$Q$ membrane resonators using ultra-high-stress crystalline TiN films

Abstract

High-quality-factor ($Q$) mechanical resonators are essential components for precise sensing and control of mechanical motion at a quantum level. While amorphous materials such as SiN have been widely used in high-$Q$ mechanical resonators utilizing stress-induced dissipation dilution, crystalline materials have emerging potential to achieve higher quality factors by combining low intrinsic loss and high tensile stress. In this paper, we demonstrate high-Q membrane resonators using ultra-high-stress crystalline TiN. Our membrane resonator exhibits a tensile stress exceeding 2.3 GPa and a quality factor of $Q=8.0\times 10^6$ at 2.2 K. By estimating the dilution factor, we infer that our TiN resonator has a intrinsic quality factor comparable to that of SiN membrane resonators. With its ultra-high stress and crystalline properties, our TiN films can serve as a powerful tool for opto- and electromechanical systems, offering highly dissipation-diluted mechanical resonators.

References in corpus (4)

• Sideband Cooling Micromechanical Motion to the Quantum Ground State
• High quality mechanical and optical properties of commercial silicon nitride membranes
• High-Q Nanomechanics via Destructive Interference of Elastic Waves
• Tensile strained $I{n}_{x}G{a}_{1-x}P$ membranes for cavity optomechanics