Computational Design of Two-Dimensional MoSi${}_2$N${}_4$ Family Field-Effect Transistor for Future Ångström-Scale CMOS Technology Nodes

Abstract

Advancing complementary metal-oxide-semiconductor (CMOS) technology into the sub-1-nm angström-scale technology nodes is expected to involve alternative semiconductor channel materials, as silicon transistors encounter severe performance degradation at physical gate lengths below 10 nm. Two-dimensional (2D) semiconductors have emerged as strong candidates for overcoming short-channel effects due to their atomically thin bodies, which inherently suppress electrostatic leakage and improve gate control in aggressively scaled field-effect transistors (FETs). Among the growing library of 2D materials, the MoSi${}_2$N${}_4$ family -- a synthetic septuple-layered materials -- has attracted increasing attention for its remarkable ambient stability, suitable bandgaps, and favorable carrier transport characteristics, making it a promising platform for next-generation transistors. While experimental realization of sub-10-nm 2D FETs remains technologically demanding, computational device simulation using first-principles density functional theory combined with nonequilibrium Green's function transport simulations provide a powerful and cost-effective route for exploring the performance limits and optimal design of ultrascaled FET. This review consolidates the current progress in the computational design of MoSi${}_2$N${}_4$ family FETs. We review the physical properties of MoSi${}_2$N${}_4$ that makes them compelling candidates for transistor applications, as well as the simulated device performance and optimization strategy of MoSi${}_2$N${}_4$ family FETs. Finally, we identify key challenges and research gaps, and outline future directions that could accelerate the practical deployment of MoSi${}_2$N${}_4$ family FET in the angström-scale CMOS era.

27 pages, 11 figures