activity
20232026
most citedAltermagnetic Flatband-Driven Fermi Surface Geometry for Giant Tunneling Magnetoresistance

8 citations · 10 across the 10 of their papers we have counts for

collaborators

12 papers

cond-mat.mtrl-sci2026

Hybrid-parity sliding multiferroics

Zhenzhou Guo, Jiangtao Yu, Shibo Fang +6

In this work, we introduce a class of hybrid-parity sliding multiferroics in which the spontaneous ferroelectric polarization is coupled to certain nonrelativistic spin splitting c…

cond-mat.mes-hall2026

Pure Spin Photocurrent in Altermagnetic Photovoltaic Battery

Qiang Li, Shibo Fang, Zongmeng Yang +11

Altermagnets, featuring momentum-dependent spin splitting without net magnetization, provide a promising platform for spintronic functionalities beyond conventional ferromagnets an…

cond-mat.mtrl-sci2026

Ferroelectric Band Twinning from Pair-State Symmetry

Shibo Fang, Jianhua Wang, Zhenzhou Guo +7

Ferroelectric switching provides a nonvolatile way to control electronic structures, but a general symmetry rule connecting the full Bloch bands of two switchable polarization stat…

cond-mat.mtrl-sci2025★ 8 cited

Altermagnetic Flatband-Driven Fermi Surface Geometry for Giant Tunneling Magnetoresistance

Xingyue Yang, Shibo Fang, Zongmeng Yang +3

Altermagnetism, characterized by zero net magnetization and symmetry-protected spin-split band structures, has recently emerged as a promising platform for spintronics. In altermag…

cond-mat.mes-hall2025

One-dimensional electronics with edge states in two-dimensional altermagnets

Shibo Fang, Zongmeng Yang, Jianhua Wang +5

The coupling between real-space inhomogeneities coordinates and spin (r-s) provides an alternative route to achieve efficient spin manipulation in spintronics beyond the convention…

cond-mat.mtrl-sci2025★ 1 cited

Computational Design of Two-Dimensional MoSiN Family Field-Effect Transistor for Future Ångström-Scale CMOS Technology Nodes

Che Chen Tho, Zongmeng Yang, Shibo Fang +9

Advancing complementary metal-oxide-semiconductor (CMOS) technology into the sub-1-nm angström-scale technology nodes is expected to involve alternative semiconductor channel mater…

cond-mat.mtrl-sci2025

Pressure-Driven Metallicity in Ångström-Thickness 2D Bismuth and Layer-Selective Ohmic Contact to MoS2

Shuhua Wang, Shibo Fang, Qiang Li +8

Recent fabrication of two-dimensional (2D) metallic bismuth (Bi) via van der Waals (vdW) squeezing method opens a new avenue to ultrascaling metallic materials into the ångström-th…

cond-mat.mtrl-sci2025

Ferroelastic Altermagnetism

Rui Peng, Shibo Fang, Pin Ho +3

Synergizing altermagnetism and other ferroic orders, such as ferroelectric switchable altermagnetism [Phys. Rev. Lett. 134, 106801 (2025) and ibid. 106802 (2025)], offers an effect…

cond-mat.mes-hall2025★ 1 cited

Unconventional tunnel magnetoresistance scaling with altermagnets

Zongmeng Yang, Xingyue Yang, Jianhua Wang +7

In conventional magnetic tunnel junctions (MTJs), the tunnel magnetoresistance (TMR) typically increases with barrier thickness as electron transmission in the antiparallel configu…

cond-mat.mes-hall2024

Bilayer TeO2: The First Oxide Semiconductor with Symmetric Sub-5-nm NMOS and PMOS

Linqiang Xu, Liya Zhao, Chit Siong Lau +7

Wide bandgap oxide semiconductors are very promising channel candidates for next-generation electronics due to their large-area manufacturing, high-quality dielectrics, low contact…

cond-mat.mes-hall2024

Symmetric n-and p-Type Sub-5-nm 1D Graphene Nanoribbon Transistors for Homogeneous CMOS Applications

Linqiang Xu, Shiqi Liu, Qiuhui Li +6

Graphene nanoribbon (GNR) emerges as an exceptionally promising channel candidate due to its tunable sizable bandgap (0-3 eV), ultrahigh carrier mobility (up to 4600 cm^(2) V^(-1)…

cond-mat.mtrl-sci2023

Sub-5 nm Gate-All-Around InP Nanowire Transistors Towards High-Performance Devices

Linqiang Xu, Lianqiang Xu, Qiuhui Li +7

Gate-all-around (GAA) nanowire (NW) field-effect transistor (FET) is a promising device architecture due to its superior gate controllability than that of the conventional FinFET a…