Ultra-steep slope cryogenic FETs based on bilayer graphene
arXiv:2408.01111 · doi:10.1021/acs.nanolett.4c02463
Abstract
Cryogenic field-effect transistors (FETs) offer great potential for a wide range of applications, the most notable example being classical control electronics for quantum information processors. In the latter context, on-chip FETs with low power consumption are a crucial requirement. This, in turn, requires operating voltages in the millivolt range, which are only achievable in devices with ultra-steep subthreshold slopes. However, in conventional cryogenic metal-oxide-semiconductor (MOS)FETs based on bulk material, the experimentally achieved inverse subthreshold slopes saturate around a few mV/dec due to disorder and charged defects at the MOS interface. FETs based on two-dimensional materials offer a promising alternative. Here, we show that FETs based on Bernal stacked bilayer graphene encapsulated in hexagonal boron nitride and graphite gates exhibit inverse subthreshold slopes of down to 250 V/dec at 0.1 K, approaching the Boltzmann limit. This result indicates an effective suppression of band tailing in van-der-Waals heterostructures without bulk interfaces, leading to superior device performance at cryogenic temperature.
22 pages, 18 figures
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- Capturing magic angles in twisted bilayer graphene from information theory markers
- Limiting performance of graphene bilayer sub-terahertz detectors at large induced band gap
- Weak localization as probe of spin-orbit-induced spin-split bands in bilayer graphene proximity coupled to WSe