Ar/Cl${}_2$ etching of GaAs optomechanical microdisks fabricated with positive electroresist

Abstract

A method to fabricate GaAs microcavities using only a soft mask with an electrolithographic pattern in an inductively coupled plasma etching is presented. A careful characterization of the fabrication process pinpointing the main routes for a smooth device sidewall is discussed. Using the final recipe, optomechanical microdisk resonators are fabricated. The results show a very high optical quality factors of $Q_{\text{opt}}>2\times 10^5$, among the largest already reported for dry-etching devices. The final devices are also shown to present high mechanical quality factors and an optomechanical vacuum coupling constant of $g_0=2\pi \times 13.6$ kHz enabling self-sustainable mechanical oscillations for an optical input power above $1$ mW.

arXiv comment12 pages, 7 figures

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