Hall sensors batch-fabricated on all-CVD h-BN/graphene/h-BN heterostructures
arXiv:1804.09924 · doi:10.1038/s41598-017-12277-8
Abstract
The two-dimensional (2D) material graphene is highly promising for Hall sensors due to its potential of having high charge carrier mobility and low carrier concentration at room temperature. Here, we report the scalable batch-fabrication of magnetic Hall sensors on graphene encapsulated in hexagonal boron nitride (h-BN) using commercially available large area CVD grown materials. The all-CVD grown h-BN/graphene/h-BN van der Waals heterostructures were prepared by layer transfer technique and Hall sensors were batch-fabricated with 1D edge metal contacts. The current-related Hall sensitivities up to 97 V/AT are measured at room temperature. The Hall sensors showed robust performance over the wafer scale with stable characteristics over six months in ambient environment. This work opens avenues for further development of growth and fabrication technologies of all-CVD 2D material heterostructures and allows further improvements in Hall sensor performance for practical applications.
References in corpus (9)
- The Raman Fingerprint of Graphene
- Boron nitride substrates for high-quality graphene electronics
- Hunting for Monolayer Boron Nitride: Optical and Raman Signatures
- Precisely aligned graphene grown on hexagonal boron nitride by catalyst free chemical vapor deposition
- Silane-Catalyzed Fast Growth of Large Single-Crystalline Graphene on Hexagonal Boron Nitride
- Ultra-sensitive Hall sensors based on graphene encapsulated in hexagonal boron nitride
- Flexible Hall Sensors Based on Graphene
- Gate-tunable Hall sensors on large area CVD graphene protected by h-BN with 1D edge contacts
- Encapsulated graphene based Hall sensors on foil with increased sensitivity