Non Volatile MoS$_{2}$ Field Effect Transistors Directly Gated By Single Crystalline Epitaxial Ferroelectric

Zhongyuan Lu; Claudy Serrao; Asif Islam Khan; Long You; Justin C. Wong; Yu Ye; Hanyu Zhu; Xiang Zhang; Sayeef Salahuddin

doi:10.1063/1.4992113

paper

Non Volatile MoS $_{2}$ Field Effect Transistors Directly Gated By Single Crystalline Epitaxial Ferroelectric

arXiv:1705.03746 · doi:10.1063/1.4992113

Abstract

We demonstrate non-volatile, n-type, back-gated, MoS $_{2}$ transistors, placed directly on an epitaxial grown, single crystalline, PbZr $_{0.2}$ Ti $_{0.8}$ O $_{3}$ (PZT) ferroelectric. The transistors show decent ON current (19 $μ A / μ$ m), high on-off ratio (10 $^{7}$ ), and a subthreshold swing of (SS ~ 92 mV/dec) with a 100 nm thick PZT layer as the back gate oxide. Importantly, the ferroelectric polarization can directly control the channel charge, showing a clear anti-clockwise hysteresis. We have selfconsistently confirmed the switching of the ferroelectric and corresponding change in channel current from a direct time-dependent measurement. Our results demonstrate that it is possible to obtain transistor operation directly on polar surfaces and therefore it should be possible to integrate 2D electronics with single crystalline functional oxides.

Non Volatile MoS $_{2}$ Field Effect Transistors Directly Gated By Single Crystalline Epitaxial Ferroelectric

Abstract

References in corpus (3)

Cited by in corpus (6)

Non Volatile MoS2​ Field Effect Transistors Directly Gated By Single Crystalline Epitaxial Ferroelectric

Abstract

References in corpus (3)

Cited by in corpus (6)

Non Volatile MoS $_{2}$ Field Effect Transistors Directly Gated By Single Crystalline Epitaxial Ferroelectric