Dislocation-free axial InAs-on-GaAs nanowires on silicon

Abstract

We report on the growth of axial InAs-on-GaAs nanowire heterostructures on silicon by molecular beam epitaxy using 20 nm diameter Au catalysts. First, the growth parameters of the GaAs nanowire segment were optimized to achieve a pure wurtzite crystal structure. Then, we developed a two-step growth procedure to enhance the yield of vertical InAs-on-GaAs nanowires. We achieved 90% of straight InAs-on-GaAs nanowires by further optimizing the growth parameters. We investigated the composition change at the interface by energy dispersive X-ray spectroscopy and the nanowire crystal structure by transmission electron microscopy. The nominal composition of the InAs segment is found to be In${}_x$Ga${}_{1-x}$As with $x$=0.85 and corresponds to 6% of lattice mismatch with GaAs. Strain mapping performed by the geometrical phase analysis of high-resolution images revealed a dislocation-free GaAs/InAs interface. In conclusion, we successfully fabricated highly mismatched heterostructures, confirming the prediction that axial GaAs/InAs interfaces are pseudomorphic in nanowires below 40 nm diameter.

References in corpus (2)

• Why does wurtzite form in nanowires of III-V zinc-blende semiconductors?
• Growth and optical properties of axial hybrid III-V/Si nanowires

Cited by in corpus (3)

• Nanowire photodetectors based on wurtzite semiconductor heterostructures
• InAs quantum dot in a needlelike tapered InP nanowire: a telecom band single photon source monolithically grown on silicon
• Full characterization and modelling of graded interfaces in a high lattice-mismatch axial nanowire heterostructure