Parallel Stitching of Two-Dimensional Materials
arXiv:1512.04492 · doi:10.1002/adma.201505070
Abstract
Diverse parallel stitched two-dimensional heterostructures are synthesized, including metal-semiconductor (graphene-MoS2), semiconductor-semiconductor (WS2-MoS2), and insulator-semiconductor (hBN-MoS2), directly through selective sowing of aromatic molecules as the seeds in chemical vapor deposition (CVD) method. Our methodology enables the large-scale fabrication of lateral heterostructures with arbitrary patterns, and clean and precisely aligned interfaces, which offers tremendous potential for its application in integrated circuits.
30 pages, 4 figures, Accepted by Advanced Materials
References in corpus (4)
Cited by in corpus (18)
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