Point contact investigations of film and interface magnetoresistance of LaSrMnO heterostructures on Nb:SrTiO
arXiv:1408.5632 · doi:10.1016/j.jmmm.2014.08.089
Abstract
STM based magnetotransport measurements of epitaxial LaSrMnO 32 nm thick films with and without an internal LaMnO layer (0-8 nm thick) grown on Nb doped SrTiO are presented. The measurements reveal two types of low field magnetoresistance (LFMR) with a magnitude of . One LFMR contribution is identified as a conventional grain boundary/domain wall scattering through the symmetric I-V characteristics, high dependence on tip placements and insensitivity to introduction of LaMnO layers. The other contribution originates from the reverse biased Nb doped SrTiO interface and the interface layer of LaSrMnO. Both LFMR contributions display a field dependence indicative of a higher coercivity (200 Oe) than the bulk film. LaMnO layers are found to reduce the rectifying properties of the junctions, and sub micron lateral patterning by electron beam lithography enhances the diodic properties, in accordance with a proposed transport model based on the locality of the injected current.
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