A facile process for soak-and-peel delamination of CVD graphene from substrates using water
arXiv:1308.1587 · doi:10.1038/srep03882
Abstract
We demonstrate a simple technique to transfer CVD-grown graphene from copper and platinum substrates using a soak-and-peel delamination technique utilizing only hot deionized water. The lack of chemical etchants results in cleaner CVD graphene films minimizing unintentional doping, as confirmed by Raman and electrical measurements. The process allows the reuse of substrates and hence can enable the use of oriented substrates for growth of higher quality graphene, and is an inherently inexpensive and scalable process for large-area production.
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- Temperature and Face Dependent Copper-Graphene Interactions
- Large-scale transfer and characterization of macroscopic periodically nano-rippled graphene
- Intercalation of O and N in the Graphene/Ni Interfaces of Different Morphology
- Graphene Induced Large Shift of Surface Plasmon Resonances of Gold Films: Effective Medium Theory for Atomically Thin Materials
- Taxonomy of defects in semi-dry transferred CVD graphene