Characterization of InSb quantum wells with atomic layer deposited gate dielectrics
arXiv:1212.1242 · doi:10.1063/1.4769225
Abstract
We report magnetotransport measurements of a gated InSb quantum well (QW) with high quality Al2O3 dielectrics (40 nm thick) grown by atomic layer deposition. The magnetoresistance data demonstrate a parallel conduction channel in the sample at zero gate voltage (Vg). A good interface between Al2O3 and the top InSb layer ensures that the parallel channel is depleted at negative Vg and the density of two-dimensional electrons in the QW is tuned by Vg with a large ratio of 6.5x1014 m-2V-1 but saturates at large negative Vg. These findings are closely related to layer structures of the QW as suggested by self-consistent Schrodinger-Poisson simulation and two-carrier model.
11 pages,3 figures
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Cited by in corpus (7)
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- Quantum transport in high-quality shallow InSb quantum wells
- Gate depletion of an InSb two-dimensional electron gas
- A double quantum dot defined by top gates in a single crystalline InSb nanosheet
- Role of chiral quantum Hall edge states in nuclear spin polarization
- Pump-probe nuclear spin relaxation study of the quantum Hall ferromagnet at filling factor nu = 2
- In-Plane Magnetoconductance Mapping of InSb Quantum Wells