76 citations
Counting papers with at most 25 authors, so collaboration author lists do not stand in for the people here.
- Samsung Austin Semiconductor (United States)US3 papers
- Northeastern UniversityUS2 papers
- University of California San DiegoUS2 papers
- AkzoNobel (Netherlands)NL1 paper
- Alexandria UniversityEG1 paper
- Amazon (Germany)DE1 paper
- Ashoka UniversityIN1 paper
- Centre National de la Recherche ScientifiqueFR1 paper
- Institute of Physics and TechnologyKZ1 paper
- Laboratoire Albert FertFR1 paper
- Microsoft (United States)US1 paper
- Moscow Institute of Physics and TechnologyRU1 paper
6 papers · 1 filter
Modeling Transient Negative Capacitance in Steep-Slope FeFETs
Borna Obradovic, Titash Rakshit, Ryan Hatcher +2
We report on measurements and modeling of FE HfZrO/SiO2 Ferroelectric-Dielectric (FE-DE) FETs which indicate that many of the phenomena attributed to Negative Capacitance can be ex…
On the Validity and Applicability of Models of Negative Capacitance and Implications for MOS Applications
J. A. Kittl, B. Obradovic, D. Reddy +3
The observation of room temperature sub-60 mV/dec subthreshold slope (SS) in MOSFETs with ferroelectric (FE) layers in the gate stacks or in series with the gate has attracted much…
Magnetic Tunnel Junction Performance Under Mechanical Strain
Niklas Roschewsky, Sebastian Schafer, Frances Hellman +1
In this work we investigate the effect of the mechanical stress on the performance of magnetic tunnel junctions (MTJ) with perpendicular magnetic anisotropy. We developed a 4-point…
Disruptive effect of Dzyaloshinskii-Moriya interaction on the MRAM cell performance
J. Sampaio, A. V. Khvalkovskiy, M. Kuteifan +5
In order to increase the thermal stability of a magnetic random access memory (MRAM) cell, materials with high spin-orbit interaction are often introduced in the storage layer. As…
General Geometric Fluctuation Modeling for Device Variability Analysis
Bo Fu, Seonghoon Jin, Woosung Choi +2
The authors propose a new modeling approach based on the impedance field method (IFM) to analyze the general geometric variations in device simulations. Compared with the direct mo…
A comparison of the carrier density at the surface of quantum wells for different crystal orientations of silicon, gallium arsenide and indium arsenide
Ryan Hatcher, Chris Bowen
We report the carrier densities at the surface of single-crystal quantum wells as a function of material, orientation and well width. We include wells constructed from silicon, gal…