300 citations · 311 across the 4 of their papers we have counts for
4 papers
Vacuum Quality Monitoring of Analytical Sputter Depth Profile Equipment by Recontamination Measurements of a Sputtered Ti Surface
Uwe Scheithauer
Often a surface sensitive analytical technique in combination with sample erosion by inert ion sputtering is used for compositional in-depth analysis of solid state samples. Layer…
A new LEED Instrument for Quantitative Spot Profile Analysis
U. Scheithauer, G. Meyer, M. Henzler
A new instrument for spot profile analysis of electron diffraction - SPA-LEED - has been set up. The instrument works either with a transparent phosphor screen for visual inspectio…
Characterisation of the primary X-ray source of an XPS microprobe Quantum 2000
U. Scheithauer
The outstanding design feature of an XPS microprobe Quantum 2000 is the double focussing ellipsoidally shaped quartz monochromator of the X-ray source. This device monochromatizes…
Sputter-Induced Cross-Contaminations in Analytical AES and XPS Instrumentation: Utilization of the effect for the In-situ Deposition of Ultrathin Functional Layers
Uwe Scheithauer
Cross contaminations are observed on sample surfaces by AES and XPS, if multiple samples are mounted on one sample holder and a neighbouring sample was sputter depth profiled. Duri…