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researcher

T. Sudarshan

9 papers hereh-index 365.1k citations424 works total

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author5
  • last author4

Across the 9 of 9 papers where every author was matched, so the position is known.

fields
  • cond-mat.mtrl-sci7
  • physics.chem-ph1
  • physics.plasm-ph1
same name
  • T. Sudarshan — 1 paper, h 3

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

activity
20102012
most citedHigh growth rate 4H-SiC epitaxial growth using dichlorosilane in a hot-wall CVD reactor

49 citations · 100 across the 9 of their papers we have counts for

collaborators
Showing 2010 · cond-mat.mtrl-sciShow all

3 papers · 2 filters

cond-mat.mtrl-sci2010★ 49 cited

High growth rate 4H-SiC epitaxial growth using dichlorosilane in a hot-wall CVD reactor

Iftekhar Chowdhury, MVS Chandrasekhar, Paul B Klein +2

Thick, high quality 4H-SiC epilayers have been grown in a vertical hot-wall chemical vapor deposition system at a high growth rate on (0001) 80 off-axis substrates. We discuss the…

cond-mat.mtrl-sci2010★ 1 cited

Effect of crystallographic dislocations on the reverse performance of 4H-SiC p-n diodes

Feng Zhao, Mohammad M. Islam, Biplob K. Daas +1

A quantitative study was performed to investigate the impact of crystallographic dislocation defects, 21 including screw dislocation, basal plane dislocation, and threading edge di…

cond-mat.mtrl-sci2010★ 21 cited

Doping Dependence of Thermal Oxidation on n-type 4H-SiC

B. K. Daas, M. M. Islam, I. A. Chowdhury +3

The doping dependence of dry thermal oxidation rates in n-type 4H-SiC was investigated. The oxidation was performed in the temperature range 1000C to 1200C for samples with nitroge…

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Not affiliated with arXiv. Researcher data from Semantic Scholar (ODC-BY) and OpenAlex.