activity
20092011
most citedEnhancement mode double top gated MOS nanostructures with tunable lateral geometry

64 citations · 133 across the 6 of their papers we have counts for

collaborators

6 papers

cond-mat.mes-hall2011★ 1 cited

Triangulating tunneling resonances in a point contact

Nathaniel C. Bishop, Ralph W. Young, Gregory A. Ten Eyck +8

We observe resonant tunneling in silicon split gate point contacts implanted with antimony and defined in a self-aligned poly-silicon double gate enhancement mode Si-MOS device str…

quant-ph2011★ 12 cited

Implications of Electronics Constraints for Solid-State Quantum Error Correction and Quantum Circuit Failure Probability

James E. Levy, Malcolm S. Carroll, Anand Ganti +6

In this paper we present the impact of classical electronics constraints on a solid-state quantum dot logical qubit architecture. Constraints due to routing density, bandwidth allo…

cond-mat.mes-hall2010★ 23 cited

Double quantum dot with tunable coupling in an enhancement-mode silicon metal-oxide semiconductor device with lateral geometry

L. A. Tracy, E. P. Nordberg, R. W. Young +9

We present transport measurements of a tunable silicon metal-oxide-semiconductor double quantum dot device with lateral geometry. Experimentally extracted gate-to-dot capacitances…

quant-ph2009

Capacitance modeling of complex topographical silicon quantum dot structures

H. L. Stalford, R. Young, E. P. Nordberg +3

Quantum dot (QD) lay-outs are becoming more complex as the technology is being applied to more complex multi-QD structures. This increase in complexity requires improved capacitanc…

cond-mat.mes-hall2009★ 33 cited

Charge sensing in enhancement mode double-top-gated metal-oxide-semiconductor quantum dots

E. P. Nordberg, H. L. Stalford, R. Young +10

Laterally coupled charge sensing of quantum dots is highly desirable, because it enables measurement even when conduction through the quantum dot itself is suppressed. In this work…

cond-mat.mes-hall2009★ 64 cited

Enhancement mode double top gated MOS nanostructures with tunable lateral geometry

E. P. Nordberg, G. A. Ten Eyck, H. L. Stalford +11

We present measurements of silicon (Si) metal-oxide-semiconductor (MOS) nanostructures that are fabricated using a process that facilitates essentially arbitrary gate geometries. S…