Showing cs.CVShow all
2 papers · 1 filter
cs.CV2024
Towards Improved Semiconductor Defect Inspection for high-NA EUVL based on SEMI-SuperYOLO-NAS
Ying-Lin Chen, Jacob Deforce, Vic De Ridder +4
Due to potential pitch reduction, the semiconductor industry is adopting High-NA EUVL technology. However, its low depth of focus presents challenges for High Volume Manufacturing.…
cs.CV2023
Deep learning denoiser assisted roughness measurements extraction from thin resists with low Signal-to-Noise Ratio(SNR) SEM images: analysis with SMILE
Sara Sacchi, Bappaditya Dey, Iacopo Mochi +2
The technological advance of High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUVL) has opened the gates to extensive researches on thinner photoresists (below 30nm…