3 papers
cs.CV2024
Towards Improved Semiconductor Defect Inspection for high-NA EUVL based on SEMI-SuperYOLO-NAS
Ying-Lin Chen, Jacob Deforce, Vic De Ridder +4
Due to potential pitch reduction, the semiconductor industry is adopting High-NA EUVL technology. However, its low depth of focus presents challenges for High Volume Manufacturing.…
eess.SP2023
Applying Machine Learning Models on Metrology Data for Predicting Device Electrical Performance
Bappaditya Dey, Anh Tuan Ngo, Sara Sacchi +3
Moore Law states that transistor density will double every two years, which is sustained until today due to continuous multi-directional innovations, such as extreme ultraviolet li…
cs.CV2023
Deep learning denoiser assisted roughness measurements extraction from thin resists with low Signal-to-Noise Ratio(SNR) SEM images: analysis with SMILE
Sara Sacchi, Bappaditya Dey, Iacopo Mochi +2
The technological advance of High Numerical Aperture Extreme Ultraviolet Lithography (High NA EUVL) has opened the gates to extensive researches on thinner photoresists (below 30nm…