activity
20062013
most citedRaman Topography and Strain Uniformity of Large-Area Epitaxial Graphene

155 citations · 339 across the 6 of their papers we have counts for

collaborators

6 papers

cond-mat.str-el2013★ 3 cited

Structural and metal-insulator transitions in ionic liquid-gated Ca3Ru2O7 surface

Conor P. Puls, Xinxin Cai, Yuhe Zhang +3

We report the fabrication and measurements of ionic liquid gated Hall bar devices prepared on thin CaRuO flakes exfoliated from bulk single crystals that were grown by…

cond-mat.mtrl-sci2011★ 42 cited

Technology ready use of single layer graphene as a transparent electrode for hybrid photovoltaic devices

Zhibing Wang, Conor P. Puls, Neal E. Staley +7

Graphene has been used recently as a replacement for indium tin oxide (ITO) for the transparent electrode of an organic photovoltaic device. Due to its limited supply, ITO is consi…

cond-mat.mtrl-sci2008★ 155 cited

Raman Topography and Strain Uniformity of Large-Area Epitaxial Graphene

J. A. Robinson, C. P. Puls, N. E. Staley +5

We report results from two-dimensional Raman spectroscopy studies of large-area epitaxial graphene grown on SiC. Our work reveals unexpectedly large variation in Raman peak positio…

cond-mat.mes-hall2008★ 26 cited

Interface states and anomalous quantum oscillations in graphene hybrid structures

C. P. Puls, N. E. Staley, Y. Liu

One- and two-layer graphene have recently been shown to feature new physical phenomena such as unconventional quantum Hall effects and prospects of supporting a non-silicon technol…

cond-mat.mes-hall2007★ 57 cited

Suppression of conductance fluctuation in weakly disordered mesoscopic graphene samples near the charge neutral point

Neal E. Staley, Conor Puls, Ying Liu

We measured the conductance fluctuation of bi- and trilayer graphene devices prepared on mechanical exfoliated graphene by an all-dry, lithography-free process using an ultrathin q…

cond-mat.mes-hall2006★ 56 cited

Lithography-Free Fabrication of Graphene Devices

N. Staley, H. Wang, C. Puls +5

We have developed a lithography-free, all-dry process for fabricating graphene devices using an ultrathin quartz filament as a shadow mask to avoid possible contamination of graphe…