most citedLong-term stability and oxidation of ferroelectric AlScN devices: An operando HAXPES study

12 citations · 15 across the 5 of their papers we have counts for

collaborators

5 papers

cs.ET2025

Millisecond-scale Volatile Memory in HZO Ferroelectric Capacitors for Bio-inspired Temporal Computing

Luca Fehlings, Thomas Mikolajick, Beatriz Noheda +1

With the broad recent research on ferroelectric hafnium oxide for non-volatile memory technology, depolarization effects in HfO2-based ferroelectric devices gained a lot of interes…

cond-mat.mtrl-sci2025

Peak splitting and bias fields in ferroelectric hafnia mediated by interface charge effects

Moritz Engl, Wassim Hamouda, Ines Häusler +5

The pristine state of hafnium based ferroelectric devices exhibits various unwanted properties, such as imprint and peak splitting, which diminish with bipolar cycling. The incorpo…

cond-mat.mtrl-sci2024★ 12 cited

Long-term stability and oxidation of ferroelectric AlScN devices: An operando HAXPES study

Oliver Rehm, Lutz Baumgarten, Roberto Guido +6

Aluminum scandium nitride (AlScN) is a promising material for ferroelectric devices due to its large remanent polarization, scalability, and compatibility with semicond…

cond-mat.mtrl-sci2024

Weight update in ferroelectric memristors with identical and non-identical pulses

Suzanne Lancaster, Maximilien Remillieux, Moritz Engl +5

Ferroelectric tunnel junctions (FTJs) are a class of memristor which promise low-power, scalable, field-driven analog operation. In order to harness their full potential, operation…

eess.SP2024★ 3 cited

Roadmap to Neuromorphic Computing with Emerging Technologies

Adnan Mehonic, Daniele Ielmini, Kaushik Roy +50

The roadmap is organized into several thematic sections, outlining current computing challenges, discussing the neuromorphic computing approach, analyzing mature and currently util…