9 citations · 10 across the 7 of their papers we have counts for
7 papers
Electrical Characterization of High-k (k>115) Crystalline SrTiO3 (STO) thin film integration with GaN with Nanomembrane Transfer Process
Md Tahmidul Alam, Kyoungjun Lee, Guangying Wang +2
High-k (115), crystalline SrTiO3 (STO) thin film was transferred on GaN for potential applications in power devices (transistor and diodes) by nanomembrane transfer method and the…
Passivation-Free Ga-Polar AlGaN/GaN Recessed-Gate HEMTs on Sapphire with 2.8 W/mm POUT and 26.8% PAE at 94 GHz
Ruixin Bai, Swarnav Mukhopadhyay, Michael Elliott +9
In this work, we demonstrate a passivation-free Ga-polar recessed-gate AlGaN/GaN HEMT on a sapphire substrate for W-band operation, featuring a 5.5 nm Al0.35Ga0.65N barrier under t…
3 kV Monolithic Bidirectional GaN HEMT on Sapphire
Md Tahmidul Alam, Swarnav Mukhopadhyay, Md Mobinul Haque +2
More than 3 kV breakdown voltage was demonstrated in monolithic bidirectional GaN HEMTs for the first time having potential applications in 1200V or 1700V-class novel power convert…
Demonstration of Si-doped Al-rich thin regrown Al(Ga)N films on AlN on sapphire templates with free carrier concentration using close-coupled showerhead MOCVD reactor
Swarnav Mukhopadhyay, Parthasarathy Seshadri, Mobinul Haque +6
Thin Si-doped Al-rich (Al>0.85) regrown Al(Ga)N layers were deposited on AlN on Sapphire template using metal-organic chemical vapor deposition (MOCVD) techniques. The optimization…
High Voltage (~2 kV) field-plated Al0.64Ga0.36N-channel HEMTs
Md Tahmidul Alam, Jiahao Chen, Kenneth Stephenson +5
High voltage (~2 kV) AlGaN-channel HEMTs were fabricated with 64% Aluminum composition in the channel. The average on-resistance was ~75 ohm. mm (~21 miliohm. cm^2) for LGD = 20 mi…
Band alignment of grafted monocrystalline Si (001)/-GaO (010) p-n heterojunction determined by X-ray photoelectron spectroscopy
Jiarui Gong, Jie Zhou, Ashok Dheenan +11
Beta-phase gallium oxide (-GaO) research has gained accelerated pace due to its superiorly large bandgap and commercial availability of large-diameter native substrates.…
Crack-free high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT on sapphire with record low sheet resistance
Swarnav Mukhopadhyay, Cheng Liu, Jiahao Chen +5
In this article, high composition (>35%) thick (>30 nm) barrier AlGaN/AlN/GaN HEMT structure grown on a sapphire substrate with ultra-low sheet resistivity (<250 Ω/ \Box ) is repor…