4 citations · 4 across the 11 of their papers we have counts for
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BOSON: Understanding and Enabling Physically-Robust Photonic Inverse Design with Adaptive Variation-Aware Subspace Optimization
Pingchuan Ma, Zhengqi Gao, Amir Begovic +6
Nanophotonic device design aims to optimize photonic structures to meet specific requirements across various applications. Inverse design has unlocked non-intuitive, high-dimension…
GPU-Accelerated Inverse Lithography Towards High Quality Curvy Mask Generation
Haoyu Yang, Haoxing Ren
Inverse Lithography Technology (ILT) has emerged as a promising solution for photo mask design and optimization. Relying on multi-beam mask writers, ILT enables the creation of fre…
Differentiable Edge-based OPC
Guojin Chen, Haoyu Yang, Haoxing Ren +2
Optical proximity correction (OPC) is crucial for pushing the boundaries of semiconductor manufacturing and enabling the continued scaling of integrated circuits. While pixel-based…
Intelligent OPC Engineer Assistant for Semiconductor Manufacturing
Guojin Chen, Haoyu Yang, Bei Yu +1
Advancements in chip design and manufacturing have enabled the processing of complex tasks such as deep learning and natural language processing, paving the way for the development…