3 citations · 3 across the 2 of their papers we have counts for
2 papers
cs.LG2024
ILILT: Implicit Learning of Inverse Lithography Technologies
Haoyu Yang, Haoxing Ren
Lithography, transferring chip design masks to the silicon wafer, is the most important phase in modern semiconductor manufacturing flow. Due to the limitations of lithography syst…
cs.LG2022★ 3 cited
Large Scale Mask Optimization Via Convolutional Fourier Neural Operator and Litho-Guided Self Training
Haoyu Yang, Zongyi Li, Kumara Sastry +5
Machine learning techniques have been extensively studied for mask optimization problems, aiming at better mask printability, shorter turnaround time, better mask manufacturability…