22 citations · 36 across the 6 of their papers we have counts for
6 papers
Plasma double layer development during high power EUV exposure
Manis Chaudhuri, Pavel Krainov, Dmitry Astakhov +2
The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC…
Laser light scattering (LLS) to observe plasma impact on the adhesion of micrometer-sized particles to a surface
D. Shefer, A. Nikipelov, M. van de Kerkhof +2
Laser Light Scattering (LLS) method, combined with a long-distance microscope was utilized to detect micrometer-sized particles on a smooth substrate. LLS was capable to detect ind…
Particle charging during pulsed EUV exposures with afterglow effect
M. Chaudhuri, L. C. J. Heijmans, M. van de Kerkhof +3
The nanoparticle charging processes along with background spatial-temporal plasma profile have been investigated with 3DPIC simulation in a pulsed EUV exposure environment. It is f…
AFM-based Hamaker Constant Determination with Blind Tip Reconstruction
Benny Ku, Ferdinandus van de Wetering, Jens Bolten +3
Particle contamination of extreme ultraviolet (EUV) photomasks is one of the numerous challenges in nanoscale semiconductor fabrication, since it can lead to systematic device fail…
Electron drag force in EUV induced pulsed hydrogen plasmas
M. Chaudhuri, A. Yakunin, M. van de Kerkhof +1
Extreme ultraviolet (EUV) induced pulsed plasma is unique due to its transient characteristics: the plasma switches between non-thermal state (when EUV power is ON at the beginning…
Dielectric particle lofting from dielectric substrate exposed to low energy electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low energy electron beam. The article dis…