2 papers
physics.plasm-ph2026
Plasma double layer development during high power EUV exposure
Manis Chaudhuri, Pavel Krainov, Dmitry Astakhov +2
The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC…
physics.app-ph2020
Dielectric particle lofting from dielectric substrate exposed to low energy electron beam
P. V. Krainov, V. V. Ivanov, D. I. Astakhov +4
The particle-in-cell simulation is applied to study a nanometer-sized dielectric particle lofting from a dielectric substrate exposed to a low energy electron beam. The article dis…