22 citations · 36 across the 6 of their papers we have counts for
4 papers · 1 filter
Plasma double layer development during high power EUV exposure
Manis Chaudhuri, Pavel Krainov, Dmitry Astakhov +2
The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC…
Laser light scattering (LLS) to observe plasma impact on the adhesion of micrometer-sized particles to a surface
D. Shefer, A. Nikipelov, M. van de Kerkhof +2
Laser Light Scattering (LLS) method, combined with a long-distance microscope was utilized to detect micrometer-sized particles on a smooth substrate. LLS was capable to detect ind…
Particle charging during pulsed EUV exposures with afterglow effect
M. Chaudhuri, L. C. J. Heijmans, M. van de Kerkhof +3
The nanoparticle charging processes along with background spatial-temporal plasma profile have been investigated with 3DPIC simulation in a pulsed EUV exposure environment. It is f…
Electron drag force in EUV induced pulsed hydrogen plasmas
M. Chaudhuri, A. Yakunin, M. van de Kerkhof +1
Extreme ultraviolet (EUV) induced pulsed plasma is unique due to its transient characteristics: the plasma switches between non-thermal state (when EUV power is ON at the beginning…