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researcher

Qing Wang

3 papers here

Matching runs newest-first, so older work may not be attached to this profile yet.

author position
  • middle author1

Across the 1 of 3 papers where every author was matched, so the position is known.

fields
  • physics.app-ph3
same name
  • Qing Wang — 20 papers, h 9
  • Qing Wang — 16 papers, h 14
  • Qing Wang — 13 papers
  • Qing Wang — 9 papers, h 8
  • Qing Wang — 9 papers
  • Qing Wang — 6 papers

Either other researchers who publish under this name, or the same person where the external sources have not merged their records.

identity via Semantic Scholar / OpenAlex

activity
20192021
most citedImproved Gate Reliability of p-GaN Gate HEMTs by Gate Doping Engineering

1 citations · 1 across the 1 of their papers we have counts for

collaborators

3 papers

physics.app-ph2021★ 1 cited

Improved Gate Reliability of p-GaN Gate HEMTs by Gate Doping Engineering

Guangnan Zhou, Fanming Zeng, Rongyu Gao +4

We present a novel p-GaN gate HEMT structure with reduced hole concentration near the Schottky interface by doping engineering in MOCVD, which aims at lowering the electric field a…

physics.app-ph2020

Determination of the Gate Breakdown Mechanisms in p-GaN Gate HEMTs by Multiple-gate-sweep Measurements

Guangnan Zhou, Fanming Zeng, Yang Jiang +5

In this work, we studied the gate breakdown mechanisms of p-GaN gate AlGaN/GaN HEMTs by a novel multiple-gate-sweep-based method. For the first time, three different breakdown mech…

physics.app-ph2019

Oxygen-based digital etching of AlGaN/GaN structures with AlN as etch-stop layers

Jingyi Wu, Siqi Lei, Wei-Chih Cheng +5

O2-plamsa-based digital etching of Al0.25Ga0.75N with a 0.8 nm AlN spacer on GaN was investigated. At 40 W RF bias power and 40 sccm oxygen flow, the etch depth of Al0.25Ga0.75N wa…

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