108 citations · 626 across the 22 of their papers we have counts for
3 papers · 2 filters
The refined EUV mask model
I. A. Makhotkin, M. Wu, V. Soltwisch +2
A refined model of an extreme ultraviolet (EUV) mask stack consisting of the Mo/Si multilayer coated by a Ru protective layer and a TaBN/TaBO absorber layer was developed to facili…
Extracting Dimensional Parameters of Gratings Produced with Self-Aligned Multiple Patterning Using GISAXS
Mika Pflüger, R. Joseph Kline, Analía Fernández Herrero +3
Background: To ensure consistent and high-quality semiconductor production at future logic nodes, additional metrology tools are needed. For this purpose, grazing-incidence small-a…
Applicability of the Debye-Waller damping factor for the determination of the line-edge roughness of lamellar gratings
Analía Fernández Herrero, Mika Pflüger, Jürgen Probst +2
Periodic nanostructures are fundamental elements in optical instrumentation as well as basis structures in integrated electronic circuits. Decreasing sizes and increasing complexit…