23 citations · 33 across the 3 of their papers we have counts for
5 papers
XeF-Enhanced Focused Ion Beam Etching and Passivation of GaSb
Pierce Maguire, Darragh Keane, Brian Kelly +2
Focused ion beams (FIBs) are widely used to modify optoelectronic devices, but their utility is severely restricted in some III-V materials due to adverse effects such as nanofibre…
Defect-Moderated Oxidative Etching of MoS2
Pierce Maguire, Jakub Jadwiszczak, Maria O'Brien +4
We report a simple technique for the selective etching of bilayer and monolayer MoS. In this work, chosen regions of MoS were activated for oxygen adsorption and reaction b…
Photoresponsivity enhancement in monolayer MoS by rapid O:Ar plasma treatment
Jakub Jadwiszczak, Gen Li, Conor P. Cullen +5
We report up to ten-fold enhancement of the photoresponsivity of monolayer MoS by treatment with O:Ar (1:3) plasma. We characterize the surface of plasma-exposed MoS by…
Suppression of the Shear Raman Mode in Defective Bilayer MoS2
Pierce Maguire, Clive Downing, Jakub Jadwiszczak +7
We investigate the effects of lattice disorders on the low frequency Raman spectra of bilayer MoS2. The bilayer MoS2 was subjected to defect engineering by irradiation with a 30 ke…
Neuromorphic MoS2 memtransistors fabricated by localised helium ion beam irradiation
Jakub Jadwiszczak, Darragh Keane, Pierce Maguire +12
Two-dimensional layered semiconductors have recently emerged as attractive building blocks for next-generation low-power non-volatile memories. However, challenges remain in the co…