activity
20012025
most citedAtomically precise placement of single dopants in Si

402 citations · 919 across the 21 of their papers we have counts for

collaborators

22 papers

quant-ph2025★ 1 cited

Strong electron-electron interactions in a dilute weakly-localized metal near a metal-to-insulator transition

Nicolò D'Anna, Jamie Bragg, Aidan G. McConnell +12

Because it is easily switched from insulator to metal either via chemical doping or electrical gating, silicon is at the core of modern information technology and remains a candida…

cond-mat.mes-hall2025

Imaging the Acceptor Wave Function Anisotropy in Silicon

Manuel Siegl, Julian Zanon, Joseph Sink +5

We present the first scanning tunneling microscopy (STM) images of hydrogenic acceptor wave functions in silicon. These acceptor states appear as square ring-like features in STM i…

quant-ph2025★ 20 cited

Roadmap on Atomic-scale Semiconductor Devices

Steven R. Schofield, Andrew J. Fisher, Eran Ginossar +47

Spin states in semiconductors provide exceptionally stable and noise-resistant environments for qubits, positioning them as optimal candidates for reliable quantum computing techno…

quant-ph2024

Element-specific, non-destructive profiling of layered heterostructures

Nicolò D'Anna, Jamie Bragg, Elizabeth Skoropata +16

Fabrication of semiconductor heterostructures is now so precise that metrology has become a key challenge for progress in science and applications. It is now relatively straightfor…

cond-mat.mtrl-sci2023

Single-Atom Control of Arsenic Incorporation in Silicon for High-Yield Artificial Lattice Fabrication

Taylor J. Z. Stock, Oliver Warschkow, Procopios C. Constantinou +3

Artificial lattices constructed from individual dopant atoms within a semiconductor crystal hold promise to provide novel materials with tailored electronic, magnetic, and optical…

physics.app-ph2023★ 32 cited

Resistless EUV lithography: photon-induced oxide patterning on silicon

Li-Ting Tseng, Prajith Karadan, Dimitrios Kazazis +7

In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated Si(100) surface in the absence of a photoresist. EUV lithography is the leading litho…