Quantitative Imaging of Sheet Resistance with a Scanning Near-Field Microwave Microscope
arXiv:cond-mat/9712171 · doi:10.1063/1.120918
Abstract
We describe quantitative imaging of the sheet resistance of metallic thin films by monitoring frequency shift and quality factor in a resonant scanning near-field microwave microscope. This technique allows fast acquisition of images at approximately 10 ms per pixel over a frequency range from 0.1 to 50 GHz. In its current configuration, the system can resolve changes in sheet resistance as small as 0.6 Ohms/sq for 100 Ohms/sq films. We demonstrate its use at 7.5 GHz by generating a quantitative sheet resistance image of a YBa2Cu3O7 (YBCO) thin film on a 5 cm-diameter sapphire wafer.
6 pages, 3 figures; To be published in Appl. Phys. Lett. (2/16/98); See also Steinhauer et al., Appl. Phys. Lett., vol. 71, p. 1736 (1997) cond-mat/9712142; See also http://www.csr.umd.edu/research/hifreq/micr_microscopy.html
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