Selective-Area Epitaxy of Bulk-Insulating (Bi${}_x$Sb${}_{1-x}$)${}_2$Te${}_3$ Films and Nanowires by Molecular Beam Epitaxy

Abstract

The selective-area epitaxy (SAE) is a useful technique to grow epitaxial films with a desired shape on a pre-patterned substrate. Although SAE of patterned topological-insulator (TI) thin films has been performed in the past, there has been no report of SAE-grown TI structures that are bulk-insulating. Here we report the successful growth of Hall-bars and nanowires of bulk-insulating TIs using the SAE technique. Their transport properties show that the quality of the selectively-grown structures is comparable to that of bulk-insulating TI films grown on pristine substrates. In SAE-grown TI nanowires, we were able to observe Aharonov-Bohm-like magnetoresistance oscillations that are characteristic of the quantum-confined topological surface states. The availability of bulk-insulating TI nanostructures via the SAE technique opens the possibility to fabricate intricate topological devices in a scalable manner.

Final version to appear in ACS Applied Materials & Interfaces. 12 pages total; 8 pages of main text with 4 figures, 4 pages of supplement with 4 figures. The raw data are available at the online depository Zenodo with the identifier https://doi.org/10.5281/zenodo.12544807

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