Inert gas as electronic impurity in semiconductors: The case for active infrared absorption in silicon

Abstract

Inert (noble gas) elements are extremely inactive to surrounding chemical environment and are frequently employed as protective gas in various semiconductor fabrication processes. In this work, we surprisingly discover that high doses of argon up to $10^{17}-10^{20}c{m}^{-3}$ can be measured in silicon exposed by laser pulses even after 1300 days. First-principles calculations and molecular dynamics identify a unique argon-locking-vacancy (ALV) defect atomic model in silicon. The ALV defect is dynamically robust in contrast to the frequently moving pure Si vacancy. While argon is chemically inert, it readily modulates defect states of the occupied vacancy via steric repulsion and rattling motions, leading to significant band splitting within bandgap and thus strong infrared absorptions. Moreover, the repulsion between substitutional argon and dangling bonds results in shallow donors which explains the confusion of enhanced n-type carriers in experiments. The work paves a way of using noble gas element to produce active infrared absorption source for the non-heteroepitaxy photonic detectors directly on silicon wafer at infrared communication wavelength.

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