Epitaxial growth of atomically thin Ga2Se2 films on c-plane sapphire substrates
arXiv:2212.11732 · doi:10.1116/6.0002446
Abstract
Broadening the variety of two-dimensional (2D) materials and improving the synthesis of ultrathin films are crucial to the development of the semiconductor industry. As a state-of-the-art 2D material, Ga2Se2 has attractive optoelectronic properties when it reaches the atomically-thin regime. However, its van der Waals epitaxial growth, especially for the atomically-thin films, has seldom been studied. In this paper, we used molecular beam epitaxy to synthesize Ga2Se2 single-crystal films with a surface roughness down to 1.82 nm on c-plane sapphire substrates by optimizing substrate temperature, Se:Ga flux ratio, and growth rate. Then we used a 3-step mode to grow Ga2Se2 films with a thickness as low as 3 tetralayers and a surface roughness as low as 0.61 nm, far exceeding the performance of direct growth. Finally, we found that the surface morphology strongly depends on the Se:Ga flux ratio, and higher growth rates widened the suitable flux ratio window for growing Ga2Se2. Overall, this work advances the understanding of the vdW epitaxy growth mechanism for post-transition metal monochalcogenides on sapphire substrates.
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Cited by in corpus (5)
- Quasi-van der Waals Epitaxial Growth of γ'-GaSe Thin Films on GaAs(111)B Substrates
- Review of Nanolayered Post-transition Metal Monochalcogenides: Synthesis, Properties, and Applications
- Epitaxial growth of atomically thin Ga2Se2 films on c-plane sapphire substrates
- Multi-modal machine learning analysis of GaSe molecular beam epitaxy growth conditions
- Unveiling the growth mode diagram of GaSe on sapphire