Single-crystal hexagonal boron nitride monolayer epitaxially grown on Cu (111) thin film across a wafer
arXiv:2105.15040 · doi:10.1038/s41586-020-2009-2
Abstract
We demonstrate single crystal growth of wafer-scale hexagonal boron nitride (hBN), an insulating atomic thin monolayer, on high-symmetry index surface plane Cu(111). The unidirectional epitaxial growth is guaranteed by large binding energy difference, ~0.23 eV, between A- and B-steps edges on Cu(111) docking with B6N7 clusters, confirmed by density functional theory calculations.
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