Cryogen-free scanning gate microscope for the characterization of Si/SiGe quantum devices at milli-Kelvin temperatures
arXiv:2105.05684 · doi:10.1063/5.0056648
Abstract
Silicon can be isotopically enriched, allowing for the fabrication of highly coherent semiconductor spin qubits. However, the conduction band of bulk Si exhibits a six-fold valley degeneracy, which may adversely impact the performance of silicon quantum devices. To date, the spatial characterization of valley states in Si remains limited. Moreover, techniques for probing valley states in functional electronic devices are needed. We describe here a cryogen-free scanning gate microscope for the characterization of Si/SiGe quantum devices at mK temperatures. The microscope is based on the Pan-walker design, with coarse positioning piezo stacks and a fine scanning piezo tube. A tungsten microscope tip is attached to a tuning fork for active control of the tip-to-sample distance. To reduce vibration noise from the pulse tube cooler, we utilize both active and passive vibration isolation mechanisms, and achieve a root-mean-square noise in of 2 nm. Our microscope is designed to characterize fully functioning Si/SiGe quantum devices. As a proof of concept, we use the microscope to manipulate the charge occupation of a Si quantum dot, opening up a range of possibilities for the exploration of quantum devices and materials.
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Cited by in corpus (8)
- Practical Strategies for Enhancing the Valley Splitting in Si/SiGe Quantum Wells
- Strategies for enhancing spin-shuttling fidelities in Si/SiGe quantum wells with random-alloy disorder
- Microwave-frequency scanning gate microscopy of a Si/SiGe double quantum dot
- In-situ scanning gate imaging of individual two-level material defects in live superconducting quantum circuits
- Dispersive readout of a silicon quantum device using an atomic force microscope-based rf gate sensor
- Second Quantization: Gating a Quantum Dot Through the Sequential Removal of Single Electrons from a Nanoscale Floating Gate
- The effects of alloy disorder on strongly-driven flopping mode qubits in Si/SiGe
- Towards Utilizing Scanning Gate Microscopy as a High-Resolution Probe of Valley Splitting in Si/SiGe Heterostructures