Thermal stability of monolayer in BEOL conditions
arXiv:2012.09046
Abstract
Monolayer tungsten disulfide () has recently attracted large interest as a promising material for advanced electronic and optoelectronic devices such as photodetectors, modulators, and sensors. Since these devices can be integrated in a silicon (Si) chip via back-end-of-line (BEOL) processes, the stability of monolayer in BEOL fabrication conditions should be studied. In this work, the thermal stability of monolayer single-crystal at typical BEOL conditions is investigated; namely (i) heating temperature of , (ii) pressures in the medium- ( mbar) and high- ( mbar) vacuum range; (iii) heating times from minutes to hours. Structural, optical and chemical analyses of are performed via scanning electron microscopy (SEM), Raman spectroscopy, photoluminescence (PL) and X-ray photoelectron spectroscopy (XPS). It is found that monolayer single-crystal is intrinsically stable at these temperature and pressures, even after hours of thermal treatment. The thermal stability of is also preserved after exposure to low-current electron beam ( pA) or low-fluence laser ( ), while higher laser fluencies cause photo-activated degradation upon thermal treatment. These results are instrumental to define fabrication and in-line monitoring procedures that allow the integration of in device fabrication flows without compromising the material quality.
21 pages, 5 figures
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