-phase Inclusions as Common Defects in Alloyed -(AlGa)O and Doped -GaO Films
arXiv:2012.00263 · doi:10.1063/5.0038861
Abstract
-GaO is a promising ultra-wide bandgap semiconductor whose properties can be further enhanced by alloying with Al. Here, using atomic-resolution scanning transmission electron microscopy (STEM), we find the thermodynamically-unstable -phase is a ubiquitous defect in both -(AlGa)O films and doped -GaO films grown by molecular beam epitaxy. For undoped -(AlGa)O films we observe -phase inclusions between nucleating islands of the -phase at lower growth temperatures (~400-600 C). In doped -GaO, a thin layer of the -phase is observed on the surfaces of films grown with a wide range of n-type dopants and dopant concentrations. The thickness of the -phase layer was most strongly correlated with the growth temperature, peaking at about 600 C. Ga interstitials are observed in -phase, especially near the interface with the -phase. By imaging the same region of the surface of a Sn-doped -(AlGa)O after ex-situ heating up to 400 C, a -phase region is observed to grow above the initial surface, accompanied by a decrease in Ga interstitials in the -phase. This suggests that the diffusion of Ga interstitials towards the surface is likely the mechanism for growth of the surface -phase, and more generally that the more-open -phase may offer diffusion pathways to be a kinetically-favored and early-forming phase in the growth of GaO.
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