A laser-ARPES study of LaNiO3 thin films grown by sputter deposition
arXiv:2002.02276 · doi:10.1063/1.5143316
Abstract
Thin films of the correlated transition-metal oxide LaNiO undergo a metal-insulator transition when their thickness is reduced to a few unit cells. Here, we use angle-resolved photoemission spectroscopy to study the evolution of the electronic structure across this transition in a series of epitaxial LaNiO films of thicknesses ranging from 19 to 2 u.c. grown in situ by RF magnetron sputtering. Our data show a strong reduction of the electronic mean free path as the thickness is reduced below 5 u.c. This prevents the system from becoming electronically two-dimensional, as confirmed by the largely unchanged Fermi surface seen in our experiments. In the insulating state we observe a strong suppression of the coherent quasiparticle peak but no clear gap. These features resemble previous observations of the insulating state of NdNiO.
arXiv commentSubmitted to APL Materials
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Cited by in corpus (4)
- RENiO3 single crystals (RE = Nd, Sm, Gd, Dy, Y, Ho, Er, Lu) grown from molten salts under 2000 bar oxygen-gas pressure
- Epitaxial growth of Ruddlesden-Popper neodymium nickelates NdNiO ( = 1-5)
- A Laser-ARPES View of the 2D Electron Systems at LaAlO3/SrTiO3 and Al/SrTiO3 Interfaces
- Layer controlled orbital selective Mott transition in monolayer nickelate