Molecular beam epitaxy of CuMnAs
arXiv:1911.01794 · doi:10.1103/PhysRevMaterials.4.014409
Abstract
We present a detailed study of the growth of the tetragonal polymorph of antiferromagnetic CuMnAs by the molecular beam epitaxy technique. We explore the parameter space of growth conditions and their effect on the microstructural and transport properties of the material. We identify its typical structural defects and compare the properties of epitaxial CuMnAs layers grown on GaP, GaAs and Si substrates. Finally, we investigate the correlation between the crystalline quality of CuMnAs and its performance in terms of electrically induced resistance switching.
arXiv comment10 pages, 8 figures and supplementary material
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Cited by in corpus (8)
- Quenching of an antiferromagnet into high resistivity states using electrical or ultrashort optical pulses
- Magneto-Seebeck microscopy of domain switching in collinear antiferromagnet CuMnAs
- Defect-driven antiferromagnetic domain walls in CuMnAs films
- Electrical transport properties of bulk tetragonal CuMnAs
- Low-Energy Switching of Antiferromagnetic CuMnAs/ GaP Using sub-10 Nanosecond Current Pulses
- Combining advanced photoelectron spectroscopy approaches to analyse deeply buried GaP(As)/Si(100) interfaces: Interfacial chemical states and complete band energy diagrams
- Probing the Manipulation of Antiferromagnetic Order in CuMnAs Films Using Neutron Diffraction
- Sub-nanosecond heat-based logic, writing and reset in an antiferromagnetic magnetoresistive memory