Largely tunable band structures of few-layer InSe by uniaxial strain
arXiv:1711.01715 · doi:10.1021/acsami.7b17247
Abstract
Due to the strong quantum confinement effect, few-layer γ-InSe exhibits a layer-dependent bandgap, spanning the visible and near infrared regions, and thus recently draws tremendous attention. As a two-dimensional material, the mechanical flexibility provides an additional tuning knob for the electronic structure. Here, for the first time, we engineer the band structures of few-layer and bulk-like InSe by uniaxial tensile strain, and observe salient shift of photoluminescence (PL) peaks. The shift rate of the optical gap is approximately 90-100 meV per 1% strain for 4- to 8-layer samples, which is much larger than that for the widely studied MoS2 monolayer. Density functional calculations well reproduce the observed layer-dependent bandgaps and the strain effect, and reveal that the shift rate decreases with increasing layer number for few-layer InSe. Our study demonstrates that InSe is a very versatile 2D electronic and optoelectronic material, which is suitable for tunable light emitters, photo-detectors and other optoelectronic devices.
arXiv commentsubmitted
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- Edge-Epitaxial Growth of InSe Nanowires toward High-Performance Photodetectors
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- Uniaxial Strain Induced Topological Phase Transition in Bismuth-Tellurohalide-Graphene Heterostructures
- Terahertz control of photoluminescence emission in few-layer InSe
- Strong atomic reconstruction in twisted bilayers of highly flexible InSe: Machine-Learned Interatomic Potential and continuum model approaches
- Transistors based on Novel 2-D Monolayer Semiconductors Bi2O2Se, InSe, and MoSi2N4 for Enhanced Logic Density Scaling
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