Gate tunable parallel double quantum dot in InAs double-nanowire junctions
arXiv:1703.03559 · doi:10.1063/1.4997646
Abstract
We report fabrication and measurement of a device where closely-placed two parallel InAs nanowires (NWs) are contacted by source and drain normal metal electrodes. Established technique includes selective deposition of double nanowires onto a previously defined gate region. By tuning the junction with the finger bottom gates, we confirmed the formation of parallel double quantum dots, one in each NW, with a finite electrostatic coupling between each other. With the fabrication technique established in this study, devices proposed for more advanced experiments, such as Cooper-pair splitting and the observation of parafermions, can be realized.
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Cited by in corpus (8)
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- Observation of nonlocal Josephson effect on double InAs nanowires
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