Angle-resolved and core-level photoemission study of interfacing the topological insulator Bi1.5Sb0.5Te1.7Se1.3 with Ag, Nb and Fe
arXiv:1504.07486 · doi:10.1103/PhysRevB.92.075127
Abstract
Interfaces between a bulk-insulating topological insulator (TI) and metallic adatoms have been studied using high-resolution, angle-resolved and core-level photoemission. Fe, Nb and Ag were evaporated onto Bi1.5Sb0.5Te1.7Se1.3 (BSTS) surfaces both at room temperature and 38K. The coverage- and temperature-dependence of the adsorption and interfacial formation process have been investigated, highlighting the effects of the overlayer growth on the occupied electronic structure of the TI. For all coverages at room temperature and for those equivalent to less than 0.1 monolayer at low temperature all three metals lead to a downward shift of the TI's bands with respect to the Fermi level. At room temperature Ag appears to intercalate efficiently into the van der Waals gap of BSTS, accompanied by low-level substitution of the Te/Se atoms of the termination layer of the crystal. This Te/Se substitution with silver increases significantly for low temperature adsorption, and can even dominate the electrostatic environment of the Bi/Sb atoms in the BSTS near-surface region. On the other hand, Fe and Nb evaporants remain close to the termination layer of the crystal. On room temperature deposition, they initially substitute isoelectronically for Bi as a function of coverage, before substituting for Te/Se atoms. For low temperature deposition, Fe and Nb are too immobile for substitution processes and show a behaviour consistent with clustering on the surface. For both Ag and Fe/Nb, these differing adsorption pathways leads to the qualitatively similar and remarkable behavior for low temperature deposition that the chemical potential first moves upward (n-type dopant behavior) and then downward (p-type behavior) on increasing coverage.
10 pages, 4 figures. In our Phys. Rev. B manuscript an error was made in formulating the last sentence of the abstract that, unfortunately, was missed in the page proofs. Version 2 on arxiv has the correct formulation of this sentence
References in corpus (6)
- Topological origin of subgap conductance in insulating bilayer graphene
- Two-dimensional Dirac fermions in a topological insulator: transport in the quantum limit
- Strong surface scattering in ultrahigh mobility Bi2Se3 topological insulator crystals
- Low carrier concentration crystals of the topological insulator BiSbTeSe: a magnetotransport study
- Observation of Distinct Bulk and Surface Chemical Environments in a Topological Insulator under Magnetic doping
- Dirac states with knobs on: interplay of external parameters and the surface electronic properties of 3D topological insulators
Cited by in corpus (6)
- Efficient Charge-Spin Conversion and Magnetization Switching though Rashba Effect at Topological Insulator/Ag Interface
- Tuning the Dirac point to the Fermi level in the ternary topological insulator (BiSb)Te
- Trigger of the ubiquitous surface band bending in 3D topological insulators
- Systemic Consequences of Disorder in Magnetically Self-Organized Topological MnBiTe(BiTe) Superlattices
- A Molecular Approach for Engineering Interfacial Interactions in Magnetic-Topological Insulator Heterostructures
- Growth, Morphology and Stability of Au in Contact with the Bi2Se3(0001) Surface