Weak Antilocalization and Linear Magnetoresistance in The Surface State of SmB6

Abstract

Strongly correlated Kondo insulator SmB6 is known for its peculiar low temperature residual conduction, which has recently been demonstrated to arise from a robust metallic surface state, as predicted by the theory of topological Kondo insulator (TKI). Photoemission, quantum oscillation and magnetic doping experiments have provided evidence for the Dirac-like dispersion and topological protection. Questions arise as whether signatures of spin-momentum locking and electron interaction could be resolved in transport measurements. Here we report metallic conduction of surface state down to mK temperatures with saturation behaviors suggestive of Kondo effect. We observe in the surface state the weak-antilocalization (WAL) effect that is in agreement with a spin-momentum locked metallic surface. At larger perpendicular magnetic fields, the surface state exhibits an unusual linear magnetoresistance similar to those found in Bi-based topological insulators and in graphene. (Correspondence to: [email protected])

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• Robustness of the Insulating Bulk in the Topological Kondo Insulator SmB${}_6$
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• Bulk and surface electronic properties of SmB6: a hard x-ray photoelectron spectroscopy study
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• Signature of surface state coupling in thin films of the topological Kondo insulator SmB${}_6$ from anisotropic magnetoresistance
• Magnetoresistance and Kondo effect in the nodal-line semimetal VAs${}_2$
• Reentrant Metallic Behavior in the Weyl Semimetal NbP
• Probing the interplay between surface and bulk states in the topological Kondo insulator SmB${}_6$ through conductance fluctuation spectroscopy
• Surface vs bulk electronic structures of a moderately correlated topological insulator YbB6 revealed by ARPES
• An STM perspective on hexaborides: Surface states of the Kondo insulator SmB${}_6$
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