Stark-Effect Scattering in Rough Quantum Wells
arXiv:1105.4173 · doi:10.1063/1.3607485
Abstract
A scattering mechanism stemming from the Stark-shift of energy levels by electric fields in semiconductor quantum wells is identified. This scattering mechanism feeds off interface roughness and electric fields, and modifies the well known 'sixth-power' law of electron mobility degradation. This work first treats Stark-effect scattering in rough quantum wells as a perturbation for small electric fields, and then directly absorbs it into the Hamiltonian for large fields. The major result is the existence of a window of quantum well widths for which the combined roughness scattering is minimum. Carrier scattering and mobility degradation in wide quantum wells are thus expected to be equally severe as in narrow wells due to Stark-effect scattering in electric fields.
4 pages, 2 figures with png format
Cited by in corpus (7)
- Strained GaN Quantum-Well FETs on Single Crystal Bulk AlN Substrates
- Limiting scattering processes in high-mobility InSb quantum wells grown on GaSb buffer systems
- On the limits to mobility in InAs quantum wells with nearly lattice-matched barriers
- Electrically Tunable Energy Bandgap in Dual-Gated Ultra-Thin Black Phosphorus Field Effect Transistors
- Enhanced mobility of ternary InGaAs quantum wells through digital alloying
- High Mobility Multiple-Channel AlScN/GaN Heterostructures
- A Compact Model for Polar Multiple-Channel Field Effect Transistors: A Case Study in III-V Nitride Semiconductors