Reduced leakage current in BiFeO3 thin films with rectifying contacts
arXiv:1105.3825 · doi:10.1063/1.3597794
Abstract
BiFeO3 thin films were grown on Pt/c-sapphire substrates by pulsed laser deposition with different growth rates. With increasing growth rate the leakage current is decreased and the conduction mechanism changes from bulk-limited Poole-Frenkel emission to interface-limited Schottky emission. In the present work, we show that only the growth rate of the BiFeO3 films close to the metal contacts has to be increased in order to reduce the leakage current and to observe saturated polarization-electric field hysteresis loops.
15 pages, 4 figures, accepted by Appl. Phys. Lett
References in corpus (3)
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- Effect of epitaxial strain on ferroelectric polarization in multiferroic BiFeO3 films
- Structural Changes and Ferroelectric Properties of BiFeO<sub>3</sub>-PbTiO<sub>3</sub> Thin Films Grown via a Chemical Multilayer Deposition Method